28.06.2006 11:02:00

SAIT (Samsung Advanced Institute of Technology) Purchases SUSS MA200Compact Mask Aligner for the Manufacture of MEMS and Display Devices

Samsung Advanced Institute of Technology (SAIT) hasrecently purchased a SUSS MA200Compact Mask Aligner for its centralresearch facility in Korea. SAIT will use the production aligner fromSUSS MicroTec (FWB:SMH) (GER:SMH) for various R&D projects, such asthe fabrication of MEMS and Display Devices.

"In recent years SAIT has emerged as the main technology driverbehind the global Samsung organization", says Mr. J. S. Kim, SeniorEngineer at SAIT, "In order to meet the tough quality demands made onus, SAIT has to rely on equipment that combines superior productperformance and an attractive cost of ownership with the flexibilityto serve different markets and applications. The MA200Compact fromSUSS MicroTec seems to be perfectly suited to our needs. The maskaligner showed excellent process capabilities for a variety ofpositive and negative resists as well as a stunning alignmentaccuracy."

"With the MA200Compact SUSS can offer an extremely versatile andcost effective production aligner for a variety of applications,starting from MEMS and Wafer Level Packaging up to optoelectronic andtelecommunication devices," comments Rolf Wolf, managing director ofSUSS MicroTec's Lithography Division. "The MA200Compact is a veryefficient exposure tool for thick resist MEMS applications and offerscustomized substrate handling for all kinds on non-standard substrateslike fragile compound semiconductors, warped, drilled and thinsubstrates, as well as glass and foils."

With an alignment accuracy less than 0.5(micron) and a throughputbetter than 100 wafers per hour the MA200Compact represents thenext-generation of SUSS full-field production lithography systems.With its high intensity illumination and high intensity optics theMA200Compact features a complete suppression of stray light effects,and a very large depth of focus, which yields excellent results evenwith high topography wafers.

About Samsung Advanced Institute of Technology (SAIT)

SAIT is the Samsung Group's central R&D organization, establishedin October 1987 as the incubator for future cutting-edge technologies.As a new business creator, SAIT constantly uncovers and developsdisruptive technologies and emerging markets. The Institute pioneerscore technologies that will represent the generation that follows thenext generation.

As a technology provider, SAIT develops distinctive,next-generation technologies that can strengthen existing businesslines. This effort results in core components, materials andsolutions. As the Samsung Group's think tank, SAIT devisesmid-/long-term technology strategies and develops excellent engineers,leading the ongoing improvement of technology management at Samsung.The Institute also supports a common technology platform group-wide.For more information go to http://www.sait.samsung.co.kr/eng/main.jsp

About SUSS MicroTec

SUSS MicroTec is a leading supplier of production, process andtest technology for the semiconductor industry. SUSS maintains itsleadership position with over 7,000 systems installed worldwide. SUSSproducts include coating developing systems, 1X full-field lithography(1XFFL) systems, substrate bonders, flip-chip bonders and probesystems. Headquartered in Munich, Germany, SUSS has 5 internationalmanufacturing sites and provides support from sales and servicecenters in North America, Europe, Asia and Japan. For moreinformation, please visit http://www.suss.com

All statements in this release other than historical facts areforward-looking statements within the meaning of U.S. PrivateSecurities Litigation Reform Act of 1995. Words such as "believe","expect", "intend", "anticipate", "estimate", "should", "may", "will","plan" and similar words and terms used in relation to the enterpriseare meant to indicate forward-looking statements of this kind. Thecompany accepts no obligation toward the general public to update orcorrect forward-looking statements. All forward-looking statements aresubject to various risks and uncertainties, as a result of whichactual events may diverge numerically from expectations. Theforward-looking statements reflect the view at the time they weremade.

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